Collimated UV light source system

Product of dienst

Collimated UV light source system

In photolithography and related applications, it is important that the light intensity is uniform over the entire substrate surface and constant in time. This can be achieved by generating a collimated light beam using mirrors and lenses. This light source generates a uniform beam of UV light with a diameter of 150 mm (6’’) and an intensity of approximately 10 mW/cm2 (at 260 nm).

Technical details

Light source
1000 W Hg/Xe lamp

Mirror sets

  • DUV (260 nm);
  • MUV (310 nm).

Beam parameters

  • diameter: 150 mm (6");
  • divergence: ≤ 2 o

Control

  • intensity controlling power supply system;
  • programmable shutter.

Applications

  • photoresist patterning;
  • photocurable coatings.